Heat treatment of semiconductor wafers where upper heater direct

Details Heat treatment of semiconductor wafers where upper heater direct Heat treatment of semiconductor wafers where upper heater direct

1997-10-14

1999-09-28

Walberg, Teresa

Electric resistance heating devices

Heating devices

Radiant heater

118728, 118724, 118725, 392416, 219390, 219405, 219411, F26B 330

Patent

active

059601590

ABSTRACT:
A substrate processing apparatus includes a substrate supporting pedestal having an upper substrate supporting pedestal and a lower substrate supporting pedestal which are vertically stacked, an upper resistance heater provided above the upper substrate supporting pedestal so as to be opposite to the upper substrate supporting pedestal, and a lower resistance heater provided under the lower substrate supporting pedestal so as to be opposite to the lower substrate supporting pedestal. Each of the upper substrate supporting pedestal and the lower substrate supporting pedestal is capable of mounting a substrate or substrates in a substantially horizontal position, and the lower substrate supporting pedestal including an opening which exposes the substrate in its entirety or openings which expose the substrates in their entireties as viewed from under the lower substrate supporting pedestal.

REFERENCES:
patent: 5414244 (1995-05-01), Imahashi

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