Heat-resistant photoresist composition and negative-type pattern

Details Heat-resistant photoresist composition and negative-type pattern Heat-resistant photoresist composition and negative-type pattern

1996-09-06

1997-07-08

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430330, G03F 732, G03F 738

Patent

active

056459793

ABSTRACT:
A heat-resistant negative-working photoresist composition comprising a resin component having a carbodiimide unit in the molecule, and a compound capable of inducing a basic compound by irradiation with actinic rays. The photosensitive layer formed by the photoresist composition shows a sufficient sensitivity even by a lower irradiation energy and can give a sharp negative-type pattern by irradiation with actinic rays such as ultraviolet rays.

REFERENCES:
patent: 4465760 (1984-08-01), Leyrer et al.
patent: 5087547 (1992-02-01), Taylor et al.
patent: 5204218 (1993-04-01), Kumada et al.
patent: 5240811 (1993-08-01), Taylor et al.
patent: 5352400 (1994-10-01), West

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