HDP-CVD uniformity control

Details HDP-CVD uniformity control HDP-CVD uniformity control

2005-05-10

2005-05-10

Meeks, Timothy (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S255370, C427S355000, C438S692000, C438S697000, C438S788000

Reexamination Certificate

active

06890597

ABSTRACT:
A combination of deposition and polishing steps are used to permit improved uniformity of a film after the combination of steps. Both the deposition and polishing are performed with processes that vary across the substrate. The combination of the varying deposition and etching rates results in a film that is substantially planar after the film has been polished. In some instances, it may be easier to control the variation of one of the two processes than the other so that the more controllable process is tailored to accommodate nonuniformities introduced by the less controllable process.

REFERENCES:
patent: 5738574 (1998-04-01), Tolles et al.
patent: 5903106 (1999-05-01), Young et al.
patent: 6015591 (2000-01-01), Li et al.
patent: 6107186 (2000-08-01), Erb
patent: 6271138 (2001-08-01), Chang et al.
patent: 6329297 (2001-12-01), Balish et al.
patent: 6406359 (2002-06-01), Birang et al.
patent: 6596654 (2003-07-01), Bayman et al.
patent: 6620726 (2003-09-01), Preusse et al.

Affiliated with

Also associated with

Rating

HDP-CVD uniformity control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with HDP-CVD uniformity control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and HDP-CVD uniformity control will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3433839