Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2005-08-30
2005-08-30
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C427S534000, C427S536000, C427S489000, C427S579000, C438S788000, C438S789000
Reexamination Certificate
active
06936309
ABSTRACT:
A method for depositing a low dielectric constant film having an improved hardness and elastic modulus is provided. In one aspect, the method comprises depositing a low dielectric constant film having silicon, carbon, and hydrogen, and then treating the deposited film with a plasma of helium, hydrogen, or a mixture thereof at conditions sufficient to increase the hardness of the film.
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Huang Tzu-Fang
Li Lihua
Xia Li-Qun
Yieh Ellie
Applied Materials Inc.
Moser Patterson & Sheridan
Padgett Marianne
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