Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1994-02-04
1995-07-18
Breneman, R. Bruce
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156345, 20419212, 20419232, 427569, 427571, C23C 1630, C23C 1650, C23C 1434, H05H 100
Patent
active
054332583
ABSTRACT:
Apparatus and methods for plasma processing involving the gettering of particles having a high charge to mass ratio away from a semiconductor wafer are disclosed. In one aspect of the invention, magnets are used to produce a magnetic field which is transverse to an electric field to draw the negative particles away from the wafer to prevent the formation of a sheath which can trap the particles. In a second aspect of the invention, a power source is connected to the wafer electrode to maintain a negative charge on the wafer, thereby preventing negative particles from being drawn to the wafer surface when the plasma is turned off. In other embodiments of the invention, a low density plasma source is used to produce a large plasma sheath which permits particles to cross a chamber to be gettered. A low density plasma discharge followed by a pulse to a higher density is used to overcome the negative effect of an insulating layer between the wafer and the wafer electrode.
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John H. Keller et al., The Transport of Dust Particles in Glow Discharge Plasmas, International Business Machines Corporation.
Barnes Michael S.
Coultas Dennis K.
Forster John C.
Keller John H.
O'Neill James A.
Baskin Jonathan D.
Breneman R. Bruce
International Business Machines - Corporation
Peterson Jr. Charles W.
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