Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-08-16
1999-03-09
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, 20429819, 20429826, 20429828, 118719, 118723R, 118730, 427538, 427551, C23C 1434
Patent
active
058795197
ABSTRACT:
A thin film coating system incorporates separate, separately-controlled deposition and reaction zones for depositing materials such as refractory metals and forming oxides and other compounds and alloys of such materials. The associated process involves rotating or translating workpieces past the differentially pumped, atmospherically separated, sequentially or simultaneously operated deposition and reaction zones and is characterized by the ability to form a wide range of materials, by high throughput, and by controlled coating thickness, including both constant and selectively varied thickness profiles.
REFERENCES:
patent: 4420385 (1983-12-01), Hartsough
patent: 4851095 (1989-07-01), Scobey et al.
patent: 5618388 (1997-04-01), Seeser
Allen Thomas H.
Dickey Eric R.
Hichwa Bryant P.
Illsley Rolf F.
Klinger Robert F.
Nguyen Nam
Optical Coating Laboratory, Inc.
VerSteeg Steven H.
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