Gate valve and vacuum container for semiconductor processing...

Details Gate valve and vacuum container for semiconductor processing... Gate valve and vacuum container for semiconductor processing...

2004-02-27

2009-11-24

Moore, Karla (Department: 1792)

Coating apparatus

Gas or vapor deposition

Chamber seal

C118S719000, C156S345310, C156S345320, C414S217000, C414S935000, C414S939000

Reexamination Certificate

active

07622008

ABSTRACT:
A gate valve (20) for a semiconductor processing system includes a housing (21) forming a plurality of passages (22A to22D) arrayed in a first direction. The passages respectively have ports (23A to23D) facing a first predetermined side in a second direction perpendicular to the first direction. The ports are respectively provided with valve seats (25A to25D) at gradually set back positions in the second direction, as being closer to a second predetermined side in the first direction. Valve plates (24A to24D) are arrayed in the second direction to open/close the ports. The valve plates are slid by an actuating mechanism (30A to30D).

REFERENCES:
patent: 5751003 (1998-05-01), Rose et al.
patent: 6698718 (2004-03-01), Yoo
patent: 2001-160578 (2001-06-01), None
patent: 2001-324032 (2001-11-01), None

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