4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Tsutomu Hiroki

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Equipment and method for processing semiconductor

Semiconductor device manufacturing: process – Miscellaneous
Reexamination Certificate

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Gate valve and vacuum container for semiconductor processing...

Coating apparatus – Gas or vapor deposition – Chamber seal
Reexamination Certificate

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Gate valve apparatus for vacuum processing system

Valves and valve actuation – With means to increase head and seat contact pressure – With positive reduction
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Gate valve apparatus of vacuum processing system

Valves and valve actuation – With means to increase head and seat contact pressure – With positive reduction
Reexamination Certificate

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Sealing ring and its managing system

Measuring and testing – Fluid pressure gauge – With protective separator
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1318162

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