Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2005-03-08
2005-03-08
Huff, Mark F. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S030000, C430S311000, C430S313000, C430S317000, C430S329000, C438S714000, C438S725000, C216S049000, C216S059000, C216S067000
Reexamination Certificate
active
06864041
ABSTRACT:
A method of fabricating an electronic chip on a wafer in which a first mask at a predetermined lower resolution is developed on the wafer and then etched under a first set of conditions for a predetermined period to achieve a mask that is below the resolution limit of current lithography. The etched mask is then used as a hard mask for etching material on a lower layer.
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Brown Jeffrey J.
Deshpande Sadanand Vinayak
Horak David V.
Surendra Maheswaran
Tsou Len Y.
Barreca Nicole
Cioffi, Esq. James J.
Huff Mark F.
International Business Machines - Corporation
McGinn & Gibb PLLC
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