Method for programming and erasing an NROM cell

Static information storage and retrieval – Floating gate – Particular biasing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C365S185290

Reexamination Certificate

active

06873550

ABSTRACT:
A nitride read only memory (NROM) cell can be programmed by applying a ramp voltage to the gate input, a constant voltage to one of the two source/drain regions, and a ground potential to the remaining source/drain region. In order to erase the NROM cell, a constant voltage is coupled to the gale input. A constant positive current is input to one of the source/drain regions. The remaining source/drain region is either allowed to float, is coupled to a ground potential, or is coupled to the first source/drain region.

REFERENCES:
patent: 4184207 (1980-01-01), McElroy
patent: 4420504 (1983-12-01), Cooper
patent: 4755864 (1988-07-01), Ariizumi
patent: 4881114 (1989-11-01), Mohsen
patent: 5241496 (1993-08-01), Lowrey
patent: 5258949 (1993-11-01), Chang
patent: 5330930 (1994-07-01), Chi
patent: 5378647 (1995-01-01), Hong
patent: 5379253 (1995-01-01), Bergemont
patent: 5397725 (1995-03-01), Wolstenholme
patent: 5467305 (1995-11-01), Bertin
patent: 5576236 (1996-11-01), Chang
patent: 5687116 (1997-11-01), Kowshik
patent: 5768192 (1998-06-01), Eitan
patent: 5792697 (1998-08-01), Wen
patent: 5858841 (1999-01-01), Hsu
patent: 5877984 (1999-03-01), Engh
patent: 5911106 (1999-06-01), Tasaka
patent: 5946558 (1999-08-01), Hsu
patent: 5966603 (1999-10-01), Eitan
patent: 5994745 (1999-11-01), Hong
patent: 6011725 (2000-01-01), Eitan
patent: 6028342 (2000-02-01), Chang
patent: 6030871 (2000-02-01), Eitan
patent: 6044022 (2000-03-01), Nachumovsky
patent: 6081456 (2000-06-01), Dadashev
patent: 6108240 (2000-08-01), Lavi
patent: 6133102 (2000-10-01), Wu
patent: 6134156 (2000-10-01), Eitan
patent: 6147904 (2000-11-01), Liron
patent: 6157570 (2000-12-01), Nachumovsky
patent: 6172396 (2001-01-01), Chang
patent: 6174758 (2001-01-01), Nachumovsky
patent: 6175523 (2001-01-01), Yang
patent: 6181597 (2001-01-01), Nachumovsky
patent: 6184089 (2001-02-01), Chang
patent: 6201282 (2001-03-01), Eitan
patent: 6201737 (2001-03-01), Hollmer
patent: 6204529 (2001-03-01), Lung
patent: 6207504 (2001-03-01), Hsieh
patent: 6208557 (2001-03-01), Bergemont
patent: 6215148 (2001-04-01), Eitan
patent: 6215702 (2001-04-01), Derhacobian
patent: 6218695 (2001-04-01), Nachumovsky
patent: 6222768 (2001-04-01), Hollmer
patent: 6240020 (2001-05-01), Yang
patent: 6243300 (2001-06-01), Sunkavalli
patent: 6251731 (2001-06-01), Wu
patent: 6255166 (2001-07-01), Ogura
patent: 6256231 (2001-07-01), Lavi
patent: 6266281 (2001-07-01), Derhacobian
patent: 6269023 (2001-07-01), Derhacobian
patent: 6272043 (2001-08-01), Hollmer
patent: 6275414 (2001-08-01), Randolph
patent: 6282118 (2001-08-01), Lung
patent: 6291854 (2001-09-01), Peng
patent: 6292394 (2001-09-01), Cohen et al.
patent: 6297096 (2001-10-01), Boaz
patent: 6303436 (2001-10-01), Sung
patent: 6327174 (2001-12-01), Jung
patent: 6348711 (2002-02-01), Eitan
patent: 6392930 (2002-05-01), Jung
patent: 6396741 (2002-05-01), Bloom
patent: 6417053 (2002-07-01), Kuo
patent: 6421275 (2002-07-01), Chen et al.
patent: 6429063 (2002-08-01), Eitan
patent: 6432778 (2002-08-01), Lai
patent: 6461949 (2002-10-01), Chang
patent: 6468864 (2002-10-01), Sung
patent: 6469342 (2002-10-01), Kuo
patent: 6477084 (2002-11-01), Eitan
patent: 6486028 (2002-11-01), Chang
patent: 6487050 (2002-11-01), Liu
patent: 6487114 (2002-11-01), Jong et al.
patent: 6490204 (2002-12-01), Bloom et al.
patent: 6498377 (2002-12-01), Lin
patent: 6514831 (2003-02-01), Liu
patent: 6531887 (2003-03-01), Sun
patent: 6545309 (2003-04-01), Kuo
patent: 6552387 (2003-04-01), Eitan
patent: 6559013 (2003-05-01), Pan
patent: 6576511 (2003-06-01), Pan
patent: 6580135 (2003-06-01), Chen
patent: 6580630 (2003-06-01), Liu et al.
patent: 6602805 (2003-08-01), Chang
patent: 6607957 (2003-08-01), Fan
patent: 6610586 (2003-08-01), Liu
patent: 6613632 (2003-09-01), Liu
patent: 6617204 (2003-09-01), Sung
patent: 6643170 (2003-11-01), Huang et al.
patent: 6671209 (2003-12-01), Lin et al.
patent: 20010001075 (2001-05-01), Ngo
patent: 20010004332 (2001-06-01), Eitan
patent: 20010011755 (2001-08-01), Tasaka
patent: 20020000606 (2002-01-01), Eitan
patent: 20020142569 (2002-10-01), Chang
patent: 20020146885 (2002-10-01), Chen
patent: 20020151138 (2002-10-01), Liu
patent: 20020177275 (2002-11-01), Liu
patent: 20020182829 (2002-12-01), Chen
patent: 20030057997 (2003-03-01), Sun
patent: 20030067807 (2003-04-01), Lin
patent: 20030072192 (2003-04-01), Bloom
patent: 20030117861 (2003-06-01), Maayan
patent: 84303740.9 (1985-01-01), None
patent: 90115805.5 (1991-02-01), None
patent: 01113179.4 (2002-12-01), None
B. Eitan et al., “Characterization of Channel Hot Electron Injection by the Subthreshold Slope of NROM™ Device,” IEEE Electron Device Lett., vol. 22, No. 11, (Nov. 2001) pp. 556-558, Copyright 2001 IEEE.
B. Eitan et al., “Spatial Characterization of Hot Carriers Injected into the Gate Dielectric Stack of a MOFSET Based on Non-Volatile Memory Device,” date unknown, pp. 58-60.
B. Eitan et al., “NROM: A Novel Localized Trapping, 2-Bit Nonvolatile Memory Cell,” IEEE Electron Device Lett, vol. 21, No. 11, (Nov. 2000), pp. 543-545, Copyright 2000 IEEE.
E. Maayan et al., “A 512Mb NROM Flash Data Storage Memory with 8MB/s Data Range,” Dig. IEEE Int. Solid-State Circuits Conf., San Francisco, (Feb. 2002), pp. 1-8, Copyright Saifun Semiconductors Ltd. 2002.
E. Maayan et al., “A 512Mb NROM Flash Data Storage Memory with 8MB/s Data Range,” ISSCC 2002 Visuals Supplement, Session 6, SRAM and Non-Volatile Memories, 6.1 and 6.2, pp. 76-77, 407-408. Copyright 1990 IEEE.
M. Janai, “Data Retention, Endurance and Acceleration Factors of NROM Devices,” IEEE 41stAnnual International Reliability Physics Symposium, Dallas, TX (2003), pp. 502-505, Copyright 1989 IEEE.
S. Minami and Y. Kamigaki, “A Novel MONOS Nonvolatile Memory Device Ensuring 10-Year Data Retention after 107Erase/Write Cycles,” IEEE Transactions on Electron Devices, vol. 40, No. 11 (Nov. 1993) pp. 2011-2017, Copyright 1998 IEEE.
C. Pan, K. Wu, P. Freiberger, A. Chatterjee, G. Sery, “A Scaling Methodology for Oxide-Nitride-Oxide Interpoly Dielectric for EPROM Applications,” IEEE Transactions on Electron Devices, vol. 37, No. 6, (Jun. 1990), pp. 1439-1443, Copyright 1990 IEEE.
P. Manos and C. Hart, “A Self-Aligned EPROM Structure with Superior Data Retention,” IEEE Electron Device Letters, vol. 11, No. 7, (Jul. 1990) pp. 309-311, Copyright 1990 IEEE.
W. Owens and W. Tchon, “E2PROM Product Issues and Technology Trends,” IEEE 1989, pp. 17-19, Copyright 1989 IEEE.
T. Huang, F. Jong, T. Chao, H. Lin, L. Leu, K. Young, C. Lin, K. Chiu, “Improving Radiation Hardness of EEPROM/Flash Cell BY N20 Annealing,” IEEE Electron Device Letters, vol. 19, No. 7 (Jul. 1998), pp. 256-258, Copyright 1998 IEEE.
B. Eitan et al., “Electrons Retention Model for Localized Charge on Oxide -Nitride-Oxide (ONO) Dielectric,” IEEE Device Lett., vol. 23, No. 9, (Sep. 2002), pp.556-558. Copyright 2002 IEEE.
T. Nozaki, T. Tanaka, Y. Kijiya, E. Kinoshita, T. Tsuchiya, Y. Hayashi, “A 1-Mb EEPROM with MONOS Memory Cell for Semiconductor Disk Application,” IEEE Journal of Solid-State Circuits, vol. 26, No. 4 (Apr. 1991), pp. 497-501, Copyright 1991 IEEE.
F. Vollebregt, R. Cuppens, F. Druyts, G. Lemmen, F. Verberne, J. Solo, “A New E(E)PROM Technology With A TiSi2Control Gate,” IEEE 1989, pp. 25.8.1-25.8.4, Copyright 1989 IEEE.
B. Eitan et al., “Impact of Programming Charge Distribution on Threshold Voltage and Subthreshold Slope of NROM Memory cells,” IEEE Transactions on Electron Devices, vol. 49, No. 11, (Nov. 2002), pp. 1939-1946, Copyright 2002 IEEE.
B. Eitan et al., “Spatial characterization of Channel hot electron injection utilizing subthreshold slope of the localized charge storage NROM™ memory device,” Non-Volatile Semiconductor Memory Workshop (NVSMW), Monterey, CA, (Aug. 2001), pp. 1-2.
B. Eitan et al., “Can NROM, a 2-bit, Trapping Storage NVM Cell, Give a Real Challenge to Floating Gate Cells?&#x

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for programming and erasing an NROM cell does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for programming and erasing an NROM cell, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for programming and erasing an NROM cell will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3440860

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.