Gas-shield electron-beam gun for thin-film curing application

Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation

Reexamination Certificate

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C250S492200, C315S111810

Reexamination Certificate

active

07012268

ABSTRACT:
An electron-beam irradiation apparatus includes an evacuatable filament-electron gun chamber housing a filament and an anode and having an inactive-gas inlet through which an inactive gas flows in; an evacuatable treatment chamber connected to an exhaust system; and a separation wall for separating the filament-electrode gun chamber and the treatment chamber. The separation wall has an aperture configured to pass electrons and gas therethrough from the filament-electron gun chamber.

REFERENCES:
patent: 5003178 (1991-03-01), Livesay
patent: 5989983 (1999-11-01), Goo et al.
patent: 6042994 (2000-03-01), Yang et al.
patent: 6057251 (2000-05-01), Goo et al.
patent: 6080562 (2000-06-01), Byrom et al.
patent: 6132814 (2000-10-01), Livesay et al.
patent: 6271146 (2001-08-01), Ross
patent: 2002/0081863 (2002-06-01), Shimada et al.
patent: 2002/0127871 (2002-09-01), Akimoto et al.
patent: 2002/0142623 (2002-10-01), Miyajima et al.
patent: 2005/0034667 (2005-02-01), Tsuji et al.

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