Gas manifold

Details Gas manifold Gas manifold

1998-03-31

2000-09-26

Bueker, Richard

Coating apparatus

Gas or vapor deposition

C23C 1600

Patent

active

061237736

ABSTRACT:
The invention relates to an apparatus and process for the vaporization of liquid precursors and deposition of a film on a suitable substrate. Particularly contemplated is an apparatus and process for the deposition of a metal-oxide film, such as a barium, strontium, titanium oxide (BST) film, on a silicon wafer to make integrated circuit capacitors useful in high capacity dynamic memory modules.

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