Gas introduction showerhead for an RTP chamber with upper and lo

Electric resistance heating devices – Heating devices – Radiant heater

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Details

219411, 118724, 239555, 432 77, H01L 2120

Patent

active

057816930

ABSTRACT:
A showerhead for use with a lamp head in a thermal processing chamber, the lamp head including a high intensity source which emits radiation that heats a substrate within the chamber, the showerhead including a top window on a side of the showerhead that is adjacent to the lamp head; a bottom window on a side of the showerhead that is adjacent to the substrate during processing; and a gas supply inlet through which a gas is introduced into a space between the top and bottom windows, wherein the top and bottom windows are transparent to the radiation from the source in the lamp head and wherein the bottom window includes a plurality of gas distribution holes through which gas is injected from the space between the top and bottom windows into the chamber.

REFERENCES:
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patent: 4745088 (1988-05-01), Inoue et al.
patent: 4880163 (1989-11-01), Kobayashi et al.
patent: 4997677 (1991-03-01), Wang et al.
patent: 5094013 (1992-03-01), Martin et al.
patent: 5155336 (1992-10-01), Gronet et al.
patent: 5156820 (1992-10-01), Wong et al.
patent: 5653806 (1997-08-01), Van Buskirk

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