Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1994-04-20
1997-04-22
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429807, 20429803, 20429833, C23C 1434
Patent
active
056226063
ABSTRACT:
At least one gas inlet arrangement with several gas outlet openings supplies a working gas and/or a reactive gas to a chamber through a line system with at least one gas source, and at a given gas pressure. The chamber is provided for the treatment of substrates, such as, in particular, by physical or chemical coating processes or by etching processes. The resistance coefficients of the outlet openings are so dimensioned with respect to the sites in the line system at the given gas pressure, that at each outlet opening, a controlled gas flow exits.
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Search Report for Swiss 01240/93.
Kugler Eduard
Rudigier Helmut
Stock Jakob
Balzers Aktiengesellschaft
Nguyen Nam
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