Gas inlet arrangement

Details Gas inlet arrangement Gas inlet arrangement

1994-04-20

1997-04-22

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429807, 20429803, 20429833, C23C 1434

Patent

active

056226063

ABSTRACT:
At least one gas inlet arrangement with several gas outlet openings supplies a working gas and/or a reactive gas to a chamber through a line system with at least one gas source, and at a given gas pressure. The chamber is provided for the treatment of substrates, such as, in particular, by physical or chemical coating processes or by etching processes. The resistance coefficients of the outlet openings are so dimensioned with respect to the sites in the line system at the given gas pressure, that at each outlet opening, a controlled gas flow exits.

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Search Report for Swiss 01240/93.

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