Coating apparatus – Gas or vapor deposition – With treating means
Patent
1996-07-09
1999-03-23
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118715, 118723I, 20429807, 4272481, 4272551, 4272552, 427569, C23C 1600
Patent
active
058853588
ABSTRACT:
A gas injection system for injecting gases into a plasma reactor having a vacuum chamber with a sidewall, a pedestal for holding a semiconductor wafer to be processed, and a RF power applicator for applying RF power into the chamber. The gas injection system includes at least one gas supply containing gas, a gas distribution apparatus which has at least one slotted aperture facing the interior of the chamber, and one or more gas feed lines connecting the gas supply or supplies to the gas distribution apparatus. A preferred embodiment of a radial gas distribution apparatus in accordance with the present invention is disposed in the chamber sidewall and includes plural gas distribution nozzles each with a slotted aperture facing an interior of the chamber. Gas feed lines are employed to respectively connect each gas distribution nozzle to separate ones of the gas supplies.
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Driscoll Timothy D.
Mak Steve S. Y.
Maydan Dan
Olgado Donald
Papanu James S.
Applied Materials Inc.
Breneman R. Bruce
Lund Jeffrie R.
Lyon Richard
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