Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2005-01-25
2005-01-25
Lund, Jeffrie R. (Department: 1763)
Coating apparatus
Gas or vapor deposition
C118S724000, C156S345290, C156S345370, C165S157000, C165S172000, C165S177000, C165S181000, C165S183000
Reexamination Certificate
active
06845732
ABSTRACT:
The present invention provides a gas heating apparatus that activates reaction gases for a chemical vapor deposition. The gas heating apparatus includes a chamber becoming enclosures of the gas heating apparatus; a heat insulating material20formed on an inner surface of the chamber so as to thermally insulate the inside of the chamber from the outside; a quartz tube having a gas inflow pipe, a gas outflow pipe, enlarged-pipe portions and abridged-pipe portion, wherein the enlarged-pipe portions and the abridged-pipe portions are alternately repeated and constitute a zigzag shape in an up-and-down direction in the chamber; a plurality of ceramic balls located inside the enlarged-pipe portions of the quartz tube; and a heater having a shape of coil spring and surrounding the zigzag shape of the quartz tube in the chamber.
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Baker & Daniels
Jusung Engineering Co. Ltd.
Lund Jeffrie R.
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