Gas flushing system for use in lithographic apparatus

Details Gas flushing system for use in lithographic apparatus Gas flushing system for use in lithographic apparatus

2005-08-23

2005-08-23

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

C250S492220, C355S030000, C355S053000, C355S055000

Reexamination Certificate

active

06933513

ABSTRACT:
In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2is provided across parts of the beam path in or adjacent to moving components of the apparatus. A variety of structures may be used to provide the laminar flow including a screen, a settling chamber, an angled inlet port and a flow path having increasing cross-sectional area.

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