Gas etching method and apparatus

Details Gas etching method and apparatus Gas etching method and apparatus

1978-03-31

1979-07-10

Weisstuch, Aaron

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

204192E, 204298, 204164, 250531, C23F 102, C23C 1500, B01K 100

Patent

active

041606906

ABSTRACT:
A gas etching apparatus comprising an etching gas-producing chamber; means for introducing into said chamber a mixture of a gas containing fluorine atoms and a gas containing oxygen atoms; means for activating the gas mixture received in the etching gas-producing chamber; an etching chamber provided in a region located apart from the etching gas-producing chamber and free from the electric field produced by the activating means; and an etching gas-conducting pipe means for establishing communication between the etching gas-producing chamber and etching chamber, the improvement being that the etching gas-conducting pipe means is designed to satisfy the following formula:

REFERENCES:
patent: 4065369 (1977-12-01), Ogawa et al.
patent: 4123663 (1978-10-01), Horiike

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