Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-03-24
1996-12-31
Kunemund, Robert
Coating apparatus
Gas or vapor deposition
With treating means
156345, 20429807, 20429833, C23C 1600
Patent
active
055890024
ABSTRACT:
A gas distribution plate for a semiconductor wafer process chamber has a symmetrical pattern of non-circular openings formed therein for the passage of gas therethrough. The smaller axis of the non-circular openings should be at least about 127 .mu.m (5 mils), and preferably at least about 254 .mu.m (10 mils), but less than about 762 .mu.m (30 mils), and preferably less than about 635 .mu.m (25 mils). The larger axis is greater than the smaller axis, preferably at least about 635 .mu.m (25 mils), and most preferably at least about 762 .mu.m (30 mils). At least some of the walls of the non-circular openings are preferably not perpendicular to the plane of the face of the gas distribution plate, but are rather slanted, at an angle of from at least 30.degree. to less than 90.degree., toward the center or axis of the outer face of the circular gas distribution plate which faces the wafer. Arcing on the face of the gas distribution plate may be further inhibited by providing peripheral conductive means on the face of the gas distribution plate electrically connected to grounded or neutral portions of the processing chamber to thereby provide a conductive path for unstable plasma at the surface of the gas distribution plate.
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Applied Materials Inc.
Kunemund Robert
Lund Jeffrie R.
Taylor John P.
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