Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With gas inlet structure
Reexamination Certificate
2005-09-13
2005-09-13
Lund, Jeffrie R. (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With gas inlet structure
C156S345330, C118S715000
Reexamination Certificate
active
06942753
ABSTRACT:
Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having a plurality of gas passages passing between an upstream side and a downstream side of the diffuser plate. At least one of the gas passages includes a first hole and a second hole coupled by an orifice hole. The first hole extends from the upstream side of the diffuser plate while the second hole extends from the downstream side. The orifice hole has a diameter less than the respective diameters of the first and second holes.
REFERENCES:
patent: 4262631 (1981-04-01), Kubacki
patent: 4532150 (1985-07-01), Endo et al.
patent: 4634601 (1987-01-01), Hamakawa et al.
patent: 4759947 (1988-07-01), Ishihara et al.
patent: 4792378 (1988-12-01), Rose et al.
patent: 4892753 (1990-01-01), Wang et al.
patent: 5000113 (1991-03-01), Wang et al.
patent: 5238866 (1993-08-01), Bolz et al.
patent: 5304248 (1994-04-01), Cheng et al.
patent: 5362526 (1994-11-01), Wang et al.
patent: 5465680 (1995-11-01), Loboda
patent: 5589002 (1996-12-01), Su
patent: 5595606 (1997-01-01), Fujikawa et al.
patent: 5624498 (1997-04-01), Lee et al.
patent: 5643394 (1997-07-01), Maydan et al.
patent: 5711987 (1998-01-01), Bearinger et al.
patent: 5730792 (1998-03-01), Camilletti et al.
patent: 5746875 (1998-05-01), Maydan et al.
patent: 5755886 (1998-05-01), Wang et al.
patent: 5776235 (1998-07-01), Camilletti et al.
patent: 5780163 (1998-07-01), Camilletti et al.
patent: 5818071 (1998-10-01), Loboda et al.
patent: 5882411 (1999-03-01), Zhao et al.
patent: 5964947 (1999-10-01), Zhao et al.
patent: 6007633 (1999-12-01), Kitamura et al.
patent: 6024799 (2000-02-01), Chen et al.
patent: RE36623 (2000-03-01), Wang et al.
patent: 6054379 (2000-04-01), Yau et al.
patent: 6072227 (2000-06-01), Yau et al.
patent: 6080446 (2000-06-01), Tobe et al.
patent: 6110287 (2000-08-01), Arai et al.
patent: 6126753 (2000-10-01), Shinriki et al.
patent: 6132512 (2000-10-01), Horie et al.
patent: 6140226 (2000-10-01), Grill et al.
patent: 6147009 (2000-11-01), Grill et al.
patent: 6159871 (2000-12-01), Loboda et al.
patent: 6167834 (2001-01-01), Wang et al.
patent: 6206972 (2001-03-01), Dunham
patent: 6230651 (2001-05-01), Ni et al.
patent: 6263829 (2001-07-01), Schnieder et al.
patent: 6284673 (2001-09-01), Dunham
patent: 6287990 (2001-09-01), Cheung et al.
patent: 6303523 (2001-10-01), Cheung et al.
patent: 6340435 (2002-01-01), Bjorkman et al.
patent: 6348725 (2002-02-01), Cheung et al.
patent: 6368450 (2002-04-01), Hayashi
patent: 6413583 (2002-07-01), Moghadam et al.
patent: 6454860 (2002-09-01), Metzner et al.
patent: 6461435 (2002-10-01), Littau et al.
patent: 6511903 (2003-01-01), Yau et al.
patent: 6511909 (2003-01-01), Yau et al.
patent: 6537929 (2003-03-01), Cheung et al.
patent: 6541282 (2003-04-01), Cheung et al.
patent: 6562690 (2003-05-01), Cheung et al.
patent: 6565661 (2003-05-01), Nguyen
patent: 6593247 (2003-07-01), Huang et al.
patent: 6596655 (2003-07-01), Cheung et al.
patent: 6627532 (2003-09-01), Gaillard et al.
patent: 6638392 (2003-10-01), Yamamoto et al.
patent: 6641673 (2003-11-01), Yang
patent: 6660663 (2003-12-01), Cheung et al.
patent: 6772827 (2004-08-01), Keller et al.
patent: 6793733 (2004-09-01), Janakiraman et al.
patent: 2001/0054381 (2001-12-01), Umotoy et al.
patent: 2002/0000670 (2002-01-01), Yau et al.
patent: 2002/0017243 (2002-02-01), Pyo
patent: 2002/0045361 (2002-04-01), Cheung et al.
patent: 2002/0129769 (2002-09-01), Kim et al.
patent: 2003/0019580 (2003-01-01), Strang
patent: 2003/0207033 (2003-11-01), Yim et al.
patent: 2004/0129211 (2004-07-01), Blonigan et al.
patent: 2004/0173313 (2004-09-01), Beach
patent: 0 613 178 (1994-08-01), None
patent: 1 118 693 (2001-07-01), None
patent: WO 01/75188 (2001-10-01), None
PCT Invitation To Pay Additional Fees dated Aug. 19, 2004.
International Search Report dated Oct. 26, 2004 for corresponding PCT Application, PCT/US03/41508.
Rader, et al., “Showerhead-enhanced inertial particle deposition in parallel-plate reactors,” Aerosol Science and Technology, 1998, V28, N2 (Feb), p105-132.
PCT Search Report dated Dec. 27, 2004 for International Application No. PCT/US2004/011477.
Choi Soo Young
Greene Robert I.
Hou Li
Shang Quanyuan
Applied Materials Inc.
Lund Jeffrie R.
Moser Patterson & Sheridan LLP
LandOfFree
Gas distribution plate assembly for large area plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas distribution plate assembly for large area plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas distribution plate assembly for large area plasma... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3431275