Coating apparatus – Gas or vapor deposition
Patent
1995-10-31
1998-08-11
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
118723E, 156345, 20429807, 20429833, C23C 1600
Patent
active
057922691
ABSTRACT:
A substrate processing system including a vacuum chamber; a pedestal which holds a substrate during processing; and a gas distribution structure which during processing is located adjacent to and distributes a process gas onto a surface of the substrate that is held on the pedestal for processing. The gas distribution structure includes a gas distribution faceplate including a plurality of gas distribution holes formed therethrough, wherein the holes of at least a first set of the plurality of holes pass through the faceplate at angles other than perpendicular to the surface of substrate.
REFERENCES:
patent: 5158644 (1992-10-01), Cheung
patent: 5589002 (1996-12-01), Su
Cheung David
Deacon Thomas E.
Huang Judy H.
Lee Peter Wai-Man
Applied Materials Inc.
Breneman R. Bruce
Lund Jeffrie R.
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