Gap forming pattern fracturing method for forming optical...

Details Gap forming pattern fracturing method for forming optical... Gap forming pattern fracturing method for forming optical...

2006-03-14

2006-03-14

Mohamedulla, Saleha R. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

C430S005000

Reexamination Certificate

active

07011926

ABSTRACT:
Within a charged particle beam exposure method for forming a patterned resist layer there is employed separating at least one adjacent pair of fractured pattern elements employed in forming a contiguous latent pattern within a blanket resist layer a gap. By employing the gap, a patterned resist layer formed incident to development of the blanket resist layer is formed with enhanced pattern fidelity and enhanced critical dimension control.

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