Gallium lanthanide oxide films

Details Gallium lanthanide oxide films Gallium lanthanide oxide films

2011-07-05

2011-07-05

Landau, Matthew C (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S591000, C438S763000, C427S255280, C257SE21193

Reexamination Certificate

active

07972974

ABSTRACT:
Electronic apparatus and methods of forming the electronic apparatus include a gallium lanthanide oxide film for use in a variety of electronic systems. The gallium lanthanide oxide film may be structured as one or more monolayers. The gallium lanthanide oxide film may be formed using atomic layer deposition.

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