Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2008-03-28
2010-11-02
Lee, Sin J. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S325000, C430S270100, C430S905000, C430S907000, C430S942000, C430S967000
Reexamination Certificate
active
07824845
ABSTRACT:
Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
REFERENCES:
patent: 6423465 (2002-07-01), Hawker et al.
patent: 6660230 (2003-12-01), McGill et al.
patent: 6908185 (2005-06-01), Chen et al.
patent: 7157052 (2007-01-01), McGill et al.
patent: 7172849 (2007-02-01), Babich et al.
patent: 2002/0197556 (2002-12-01), Huang et al.
patent: 2005/0042538 (2005-02-01), Babich et al.
patent: 2005/0233254 (2005-10-01), Hatakeyama et al.
patent: 2006/0063905 (2006-03-01), Nakagawa et al.
patent: 2007/0003440 (2007-01-01), McGill et al.
patent: 2007/0020467 (2007-01-01), Nakagawa et al.
patent: 2007/0190461 (2007-08-01), Ozaki et al.
patent: 2007/0254235 (2007-11-01), Allen et al.
Allen Robert D.
Colburn Matthew E.
Sanders Daniel P.
Sooriyakumaran Ratnam
Truong Hoa D.
Cantor & Colburn LLP
International Business Machines - Corporation
Lee Sin J.
LandOfFree
Functionalized carbosilane polymers and photoresist... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Functionalized carbosilane polymers and photoresist..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Functionalized carbosilane polymers and photoresist... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4185305