Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2006-08-01
2006-08-01
Dang, Phuc T. (Department: 2818)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S729000
Reexamination Certificate
active
07084064
ABSTRACT:
A method and apparatus for electrochemically processing metal and barrier materials is provided. In one embodiment, a method for electrochemically processing a substrate includes the steps of establishing an electrically-conductive path through an electrolyte between an exposed layer of barrier material on the substrate and an electrode, pressing the substrate against a processing pad assembly with a force less than about 2 psi, providing motion between the substrate and pad assembly in contact therewith and electrochemically removing a portion of the exposed layer during a first electrochemical processing step in a barrier processing station.
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Chen Liang-Yuh
Hu Yongqi
Liu Feng Q.
Tsai Stan D.
Applied Materials Inc.
Dang Phuc T.
Patterson and Sheridan
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