Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1986-11-06
1989-06-13
Morgenstern, Norman
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, 437235, 437245, 4271263, 4271264, C23C 1400, B05D 512
Patent
active
048390100
ABSTRACT:
Method of forming an antireflective coating on a face of a semiconductor which includes forming a metal oxide layer on the face, heating the oxide layer to a temperature sufficiently high to cause the migration of free metal atoms over the surface of the metal oxide and then sputtering a thin layer of aluminum or aluminum alloy on the oxide layer of a thickness such that bumps are formed which reduce the specularity of the surface. The aluminum atoms form bumps which reduce the specularity of the surface.
REFERENCES:
patent: 3884698 (1975-05-01), Kakihama
patent: 4307132 (1981-12-01), Chu et al.
patent: 4462884 (1984-07-01), Gillery
patent: 4490184 (1984-12-01), Forcht et al.
Cleavelin Cloves R.
Phillips Danny
Braden Stanton C.
Burke Margaret
Comfort James T.
Morgenstern Norman
Sharp Melvin
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