Forming a cap above a metal layer

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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Reexamination Certificate

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07056817

ABSTRACT:
In one embodiment, the present invention includes an apparatus having a metal layer with a pad disposed above a substrate; and a cap disposed above the metal layer having a first portion to provide for contact with a probe and a second portion to provide a bonding surface, and the cap is electrically coupled to the pad.

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patent: 5554940 (1996-09-01), Hubacher
patent: 5783868 (1998-07-01), Galloway
patent: 6265300 (2001-07-01), Bhansali et al.
patent: 6376899 (2002-04-01), Seshan et al.
patent: 6429532 (2002-08-01), Han et al.
patent: 6534853 (2003-03-01), Liu et al.
patent: 2002/0173133 (2002-11-01), Towle et al.
patent: 1 176 637 (2002-01-01), None
patent: 04 142053 (1992-05-01), None

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