Fork-like memory structure for ULSI DRAM and method of fabricati

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

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438396, 438947, H01L 218242

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active

060109327

ABSTRACT:
A masking and etching technique during the formation of a memory cell capacitor which simultaneously separates storage poly into individual storage poly nodes and etches recesses into the storage poly nodes which increase the surface area of the storage poly nodes and thereby increase the capacitance of a completed memory cell without additional processing steps.

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