Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1996-12-05
2000-01-04
Brown, Peter Toby
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438396, 438947, H01L 218242
Patent
active
060109327
ABSTRACT:
A masking and etching technique during the formation of a memory cell capacitor which simultaneously separates storage poly into individual storage poly nodes and etches recesses into the storage poly nodes which increase the surface area of the storage poly nodes and thereby increase the capacitance of a completed memory cell without additional processing steps.
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Ma Manny Kin F.
Schoenfeld Aaron
Brown Peter Toby
Micro)n Technology, Inc.
Thomas Toniae M.
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