Focused ion beam optical axis adjustment method and focused ion

Details Focused ion beam optical axis adjustment method and focused ion Focused ion beam optical axis adjustment method and focused ion

1997-09-04

1999-10-19

Nguyen, Kiet T.

Radiant energy

Inspection of solids or liquids by charged particles

Positive ion probe or microscope type

H01J 37317

Patent

active

059693550

ABSTRACT:
To provide a focused ion beam optical axis alignment method and a focused ion beam apparatus which make axis alignment work of for example when replacing an ion source of a focused ion beam apparatus easy. A method for adjusting the optical axis of a focused ion beam apparatus having an ion source part 3 made up of an ion source 1 for producing an ion beam and a pullout electrode 2, a monitoring aperture 5 which passes a central part having a high energy density of the ion beam and measures the electric current thereof, a charged particle optical system 9 including a condenser lens 6, an aperture 7 and an objective lens 8, and a deflecting electrode 16 which scans the focused ion beam, wherein while moving the ion source 1 in a direction intersecting orthogonally with the optical axis of the ion beam the current measured by the monitoring aperture 5 and the overall ion beam quantity produced from the ion source are monitored and a voltage impressed on the pullout electrode is controlled so that this current becomes constant and the position of the ion source 1 is adjusted so that the overall ion beam quantity becomes a minimum.

REFERENCES:
patent: 5055696 (1991-10-01), Haraichi et al.
patent: 5065034 (1991-11-01), Kawanami et al.
patent: 5852297 (1998-12-01), Ishitani et al.

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