Focused ion beam optical axis adjustment method and focused ion

Details Focused ion beam optical axis adjustment method and focused ion Focused ion beam optical axis adjustment method and focused ion

1997-09-09

1999-06-29

Berman, Jack I.

Radiant energy

Inspection of solids or liquids by charged particles

Positive ion probe or microscope type

25049221, 2504911, 250423R, H01J 3715, H01J 37256, H01J 37304

Patent

active

059171863

ABSTRACT:
To provide a focused ion beam optical axis alignment method and a focused ion beam apparatus which make axis alignment work of for example when replacing an ion source of a focused ion beam apparatus easy. A method for adjusting the optical axis of a focused ion beam apparatus having an ion source part 3 made up of an ion source 1 for producing an ion beam and a pullout electrode 2, a first aperture 5 which passes a central part having a high energy density of the ion beam and measures the electric current thereof, a charged particle optical system 9 including a condenser lens 6, a second aperture 7 and an objective lens 8, a deflecting electrode 16 which scans the focused ion beam, and a secondary charged particle detector for detecting secondary charged particles arising as a result the focused ion beam being radiated onto a sample, wherein while moving the ion source 1 in a direction intersecting orthogonally with the optical axis of the ion beam the amount of secondary charged particles detected by the secondary charged particle detector is monitored and the position of the ion source 1 is adjusted so this amount of secondary charged particles becomes a maximum.

REFERENCES:
patent: 4524277 (1985-06-01), Shimura et al.
patent: 5420415 (1995-05-01), Trueira

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