Focused ion beam imaging and process control

Details Focused ion beam imaging and process control Focused ion beam imaging and process control

1988-02-26

1989-10-17

Berman, Jack I.

Radiant energy

Inspection of solids or liquids by charged particles

Positive ion probe or microscope type

250307, 2504922, 356314, 156626, H01J 37304

Patent

active

048749478

ABSTRACT:
Ion beam machining apparatus which uses a focused ion beam to sputter particles from a target is disclosed. The beam is scanned over the target and photons emitted in response to the incidence of the beam on the target are analyzed to identify the different materials in the target and the location of these materials. Electrons are projected in a stream to the impingement site of the ion beam, in order to neutralize the charge produced by the beam and thereby stabilize the position of this site, and the photon detectors are isolated from any light emitted by the electron source.

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