Focus ring arrangement for substantially eliminating unconfined

Details Focus ring arrangement for substantially eliminating unconfined Focus ring arrangement for substantially eliminating unconfined

1998-06-26

1999-12-07

Bettendorf, Justin P.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

361234, 118728, H05H 102

Patent

active

059989327

ABSTRACT:
A focus ring assembly configured to substantially encircle a chuck of a plasma processing chamber. The focus ring assembly includes an annular dielectric body; and an electrically conductive shield surrounding the annular dielectric body. The electrically conductive shield is configured to be electrically grounded within the plasma processing chamber and includes a tube-shaped portion being disposed outside of the annular dielectric body and surrounding at least part of the annular dielectric body. The electrically conductive shield further includes an inwardly-protruding flange portion being in electrical contact with the tube-shaped portion. The flange portion forms a plane that intersects the tube-shaped portion. The flange portion is embedded within the annular dielectric body.

REFERENCES:
patent: 5534751 (1996-07-01), Lenz et al.
patent: 5569356 (1996-10-01), Lenz et al.
patent: 5589003 (1996-12-01), Zhao et al.
patent: 5868848 (1999-02-01), Tsukamoto
patent: 5891348 (1999-04-01), Ye et al.

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