Fluid delivery system and method

Details Fluid delivery system and method Fluid delivery system and method

1997-07-11

2000-07-04

Lund, Jeffrie R

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 156345, 20429807, 20429825, C23C 1600

Patent

active

060833211

ABSTRACT:
The present invention generally provides a gas delivery system adapted for positioning near the process chamber. More particularly, the present invention provides an apparatus for processing a substrate that includes a process chamber and a gas delivery system. The gas delivery system is in fluid communication with and is adapted to supply one or more process gases and/or carrier/purge gases to the process chamber. The gas delivery system is positioned proximal the process chamber within about two to three feet of the process chamber.

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