Flat-panel display semiconductor process for efficient...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer

Reexamination Certificate

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Details

C438S510000, C257SE21170, C257SE21320, C257SE21247, C257SE21267, C257SE21329, C257SE21347, C257SE21411

Reexamination Certificate

active

07863115

ABSTRACT:
An embodiment is a method and apparatus to fabricate a flat panel display. A poly-last structure is formed for a display panel using an amorphous silicon or amorphous silicon compatible process. The poly-last structure has a channel silicon precursor. The display panel is formed from the poly-last structure using a polysilicon specific or polysilicon compatible process.

REFERENCES:
patent: 5817550 (1998-10-01), Carey et al.
patent: 6680485 (2004-01-01), Carey et al.
patent: 7476601 (2009-01-01), Chao et al.

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