Flash memory device having poly spacers

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C257S315000

Reexamination Certificate

active

11100123

ABSTRACT:
A non-volatile memory device includes a substrate having a first active region and a second active region. A first floating gate is provided over the first active region and having an edge, the first floating gate being made of a conductive material. A first spacer is connected to the edge of the first floating gate and being made of the same conductive material as that of the first floating gate. A control gate is provided proximate to the floating gate.

REFERENCES:
patent: 5674768 (1997-10-01), Chang et al.
patent: 5943261 (1999-08-01), Lee
patent: 6372617 (2002-04-01), Kitamura
patent: 6436767 (2002-08-01), Koishikawa
patent: 6642570 (2003-11-01), Tseng

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