Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-07-31
2007-07-31
Lee, Calvin (Department: 2818)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C257S315000
Reexamination Certificate
active
11100123
ABSTRACT:
A non-volatile memory device includes a substrate having a first active region and a second active region. A first floating gate is provided over the first active region and having an edge, the first floating gate being made of a conductive material. A first spacer is connected to the edge of the first floating gate and being made of the same conductive material as that of the first floating gate. A control gate is provided proximate to the floating gate.
REFERENCES:
patent: 5674768 (1997-10-01), Chang et al.
patent: 5943261 (1999-08-01), Lee
patent: 6372617 (2002-04-01), Kitamura
patent: 6436767 (2002-08-01), Koishikawa
patent: 6642570 (2003-11-01), Tseng
Chou Kai-Cheng
Rabkin Peter
Wang Hsingya Arthur
Hynix / Semiconductor Inc.
Lee Calvin
Townsend & Townsend & Crew LLP
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