Flash memory device capable of erasing flash blocks in SOI...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S211000, C257SE21179

Reexamination Certificate

active

07491597

ABSTRACT:
Provided is a flash memory, and more particularly, to a method and structure for erasing flash blocks based on back-bias. The method comprises the steps of forming a flash block on a silicon on insulator (SOI) substrate and forming a body-electrode on back side of the silicon on insulator (SOI) substrate.

REFERENCES:
patent: 6424011 (2002-07-01), Assaderaghi et al.

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