Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-04-26
2009-02-17
Pham, Hoai v (Department: 2892)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S211000, C257SE21179
Reexamination Certificate
active
07491597
ABSTRACT:
Provided is a flash memory, and more particularly, to a method and structure for erasing flash blocks based on back-bias. The method comprises the steps of forming a flash block on a silicon on insulator (SOI) substrate and forming a body-electrode on back side of the silicon on insulator (SOI) substrate.
REFERENCES:
patent: 6424011 (2002-07-01), Assaderaghi et al.
Choi Yang-Kyu
Lee Hyun-jin
Abelman ,Frayne & Schwab
Ahn Harry K.
Korea Advanced Institute of Science and Technology
Pham Hoai v
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