Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1997-12-22
2000-01-04
Ngo, Ngan V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257315, 257316, H01L 29788
Patent
active
060112883
ABSTRACT:
A vertical memory device on a silicon semiconductor substrate comprises a floating gate trench in the substrate, in the array, the trench. The walls of the floating gate trench were doped with a threshold implant through the trench surfaces. There is a tunnel oxide layer on the trench surfaces, the tunnel oxide layer having outer surfaces. There is a floating gate electrode in the trench on the outer surfaces of the tunnel oxide layer. There are source/drain regions in the substrate self-aligned with the floating gate electrode. The source line and a drain line form above the source region and the drain region respectively. An interelectrode dielectric layer overlies the top surface of the floating gate electrode, and the source line and the drain line, and there is a control gate electrode over the interelectrode dielectric layer over the top surface of the floating gate electrode.
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Chen Jong
Chen Shui Hung
Kuo Di-Son
Lin Chrong-Jung
Ackerman Stephen B.
Jones II Graham S.
Ngo Ngan V.
Saile George O.
Taiwan Semiconductor Manufacturing Company , Ltd.
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