Fine pattern forming process using a resist composition sensitiv

Details Fine pattern forming process using a resist composition sensitiv Fine pattern forming process using a resist composition sensitiv

1997-07-23

1998-07-14

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430170, 4302701, 430326, 430330, 430512, 430905, 430926, 430927, G03F 730, G03F 152

Patent

active

057802068

ABSTRACT:
A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the action of an acid, (ii) a combination of an alkali-soluble resin and a dissolution-inhibiting compound, and (iii) a combination of an alkali-soluble resin and a crosslinkable compound, (b) an acid generater, (c) a special anthracene derivative, and (d) a solvent, is suitable for forming a pattern using deep ultraviolet light, KrF excimer laser light, etc., on a highly reflective substrate having level differences due to absorption of undesirable reflected deep ultraviolet light.

REFERENCES:
patent: 5059512 (1991-10-01), Babich et al.
patent: 5250395 (1993-10-01), Allen et al.
patent: 5272042 (1993-12-01), Allen et al.
patent: 5376498 (1994-12-01), Kajita et al.
patent: 5695910 (1997-12-01), Urano et al.

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