Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging
Patent
1991-12-20
1993-10-12
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Electron beam imaging
430270, 430311, 430313, 430330, 430942, G03C 500
Patent
active
052524302
ABSTRACT:
The fine pattern forming method includes the steps of applying an organic polymer film on a semiconductor substrate and heat treating the same; applying a resin solution (including an acid degradation polymer or an acid reactive monomer, an acid generator capable of generating an acid by irradiation with an electric charged beam, and a silicone resin) on the organic polymer layer and heat treating the same; carrying out a heat treatment after a pattern is written, causing the generated acid to react with the acid degradation polymer or the acid reactive monomer and carrying out a development in an alkaline solution to form a resist pattern; and etching the organic polymer layer using the resist pattern as a mask. The use of the resist layer including the silicone resin, the acid generator, and the acid degradation polymer or the acid reactive monomer enables an accurate fine resist pattern to be formed which has a high sensitivity and dry etching resistance, and in which charging is prevented when a pattern is written by a charged beam.
REFERENCES:
patent: 4689289 (1987-08-01), Crivello
patent: 4863833 (1989-09-01), Fukuyama et al.
patent: 4939070 (1990-07-01), Brunsvold et al.
patent: 4968583 (1990-11-01), Ohshio
patent: 5019485 (1991-05-01), Nakamura
patent: 5110711 (1992-05-01), Babich
Hashimoto Kazuhiko
Nomura Noboru
Duda Kathleen
Matsushita Electric - Industrial Co., Ltd.
McCamish Marion E.
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