Fine pattern forming method

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

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Details

430311, 430313, 430323, 430325, 430330, B05D 306, G03C 500

Patent

active

050305492

ABSTRACT:
Provided is a method for forming fine pattern free from shear of pattern caused by charging and high in dry etch resistance by using a high molecular organic film containing an organometallic complex or a metallic salt in single-layer or multi-layer resist process and treating the surface of this film with a reducing agent to form a metallic layer on the surface.

REFERENCES:
patent: 3885076 (1975-05-01), Heidenreich et al.
patent: 4027052 (1977-05-01), Thompson

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