Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-07-05
2005-07-05
Pham, Hoai (Department: 2814)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S206000, C438S267000
Reexamination Certificate
active
06913960
ABSTRACT:
The present invention provides a dynamic threshold (DT) CMOS FET and a method for forming the same that results in improved device performance and density. The preferred embodiment of the present invention provides a DT CMOS FET with a short, low resistance connection between the gate and the body and with low body-source/drain capacitance. The low body-source/drain capacitance is achieved using a thin, fin-type body. The low resistance connection between the gate and the body contact is achieved by having the gate and body contact aligned on opposite long sides of the fin with a bridge over the top of the narrow fin electrically connecting the gate and body.
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Bryant Andres
Muller K. Paul
Nowak Edward J.
Sabo William D.
Schmeiser Olsen & Watts
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