Film thickness and composition measurement via auger...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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C250S305000, C250S307000, C250S311000, C250S288000, C378S046000, C378S045000, C324S754120

Reexamination Certificate

active

11132152

ABSTRACT:
In various embodiments, techniques are described for combining an X-ray detector (e.g., for providing EPMA) and an electron detector (e.g., for providing AES) to provide a tool for determining film compositions and thicknesses on a specimen, such as a semiconductor structure or wafer. In one embodiment, a system includes a beam generator configurable to direct an electron beam towards a specimen. The electron beam may generate Auger electrons and X-rays. The system may also include at least one electron detector disposed adjacent to (e.g., above) the specimen to detect electrons and measure their energies emanating from a top layer of the specimen. One or more X-ray detectors may be disposed adjacent to the specimen to detect X-rays.

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patent: 6781126 (2004-08-01), Kadyshevitch et al.
patent: 6787773 (2004-09-01), Lee
Powell, Characterization of Thin Films on Nanometer Scale by Auger Electron Sprectroscopy and X-Ray Photoelectorn Spectroscopy, Applied Surface Science 239 (2005), pp. 470-480.
Heinrich, Electron Probe Quantitation, Chemical Science and Technology Labratory, national Institue of Standards and Technology, Gaithersburg, MD (1991).
Baro,Algorithm for Monte Carlo Simulation of Penetration and Energy Loss of Electrons and Positrons in Matter,Nuclear Instruments and Methods in Physics Research B 100 (1995).
Werner, Partial Intensity Analysis (PIA) for Quantitative Electron Spectroscopy, Surface and Interface Analysis, vol. 23, pp. 737-752 (1995).
Press, Numerical Recipes in C, The Art of Scientific Computing, Second Eddition, pp. 657-659 and 671-675 (1992).

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