Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2002-09-27
2010-02-16
McDonald, Rodney G (Department: 1795)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S192260, C216S065000, C216S066000, C216S094000, C216S024000, C430S005000
Reexamination Certificate
active
07662263
ABSTRACT:
A process is provided for producing near-perfect optical surfaces, for EUV and soft-x-ray optics. The method involves polishing or otherwise figuring the multilayer coating that has been deposited on an optical substrate, in order to correct for errors in the figure of the substrate and coating. A method such as ion-beam milling is used to remove material from the multilayer coating by an amount that varies in a specified way across the substrate. The phase of the EUV light that is reflected from the multilayer will be affected by the amount of multilayer material removed, but this effect will be reduced by a factor of 1−n as compared with height variations of the substrate, where n is the average refractive index of the multilayer.
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Mackowski et al., “VIRGO Mirrors: Wavefront Control”, Opt and Quant. Elec. 31, 507-514 (1999) (for the case of visible-light optics).
A study by Spence et al. “Film-stress-induced deformation of EUV reflective optics,” Proc. SPIE 3679,724-734(1999) shows that the non-spherical deformation due to film stress variation of 10% is small, on the order of 0.1 nm RMS.
Chapman Henry N.
Taylor John S.
EUV LLC.
McDonald Rodney G
Rutan & Tucker LLP
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