Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-05-16
2006-05-16
Picardat, Kevin M. (Department: 2822)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S046000, C438S232000, C438S285000, C438S933000
Reexamination Certificate
active
07045412
ABSTRACT:
In a semiconductor multi-layer structure in which a first SiGe layer having a first conductivity-type and high impurity concentration, a second SiGe layer having the first conductivity-type and a low impurity concentration and a Si layer having a low impurity concentration are formed one on another in this order on a Si substrate of the first conductivity-type, a channel is formed in a part of the Si layer and a source electrode passes through the second SiGe layer of low impurity concentration to electrically contact the first SiGe layer of high impurity concentration or the substrate.
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Morikawa Masatoshi
Sugii Nobuyuki
Washio Katsuyoshi
Yoshida Isao
Mattingly ,Stanger ,Malur & Brundidge, P.C.
Picardat Kevin M.
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