Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-07-05
2005-07-05
Nelms, David (Department: 2818)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S003000
Reexamination Certificate
active
06913967
ABSTRACT:
The inventive ferroelectric memory device includes: a semiconductor substrate providing elements of a transistor; a first inter-layer insulating layer formed on the semiconductor substrate; a storage node contact connected to elements of the transistor by passing through the first inter-layer insulating layer; a barrier layer contacting simultaneously to the storage node contact and the first inter-layer insulating layer; a lower electrode having a space for isolating the first inter-layer insulating layer and being formed on the barrier layer; a glue layer being formed on the first inter-layer insulating layer and encompassing lateral sides of the lower electrode as filling the space; a second inter-layer insulating layer exposing a surface of the lower electrode and encompassing the glue layer; a ferroelectric layer formed on the glue layer including the second inter-layer insulating layer; and an upper electrode formed on the ferroelectric layer.
REFERENCES:
patent: 5679969 (1997-10-01), Evans et al.
patent: 6638775 (2003-10-01), Kweon
patent: 6812089 (2004-11-01), Choi et al.
Choi Eun-Seok
Yeom Seung-Jin
Blakely & Sokoloff, Taylor & Zafman
Hoang Quoc
Hynix / Semiconductor Inc.
Nelms David
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