Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-03-13
2007-03-13
Pizarro-Crespo, Marcos D. (Department: 2814)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S253000
Reexamination Certificate
active
11029355
ABSTRACT:
A capacitor upper electrode and a wiring are electrically connected to each other by using a plug and a conductive layer formed below a capacitive element without using a plug that directly connects the capacitor upper electrode to the wiring provided thereon via an interlayer insulating film therebetween. Alternatively, the capacitor upper electrode is covered by a conductive hydrogen barrier film, and the capacitor upper electrode and the wiring are electrically connected to each other via both a plug connecting the wiring and the conductive hydrogen barrier film to each other and the conductive hydrogen barrier film.
REFERENCES:
patent: 5567636 (1996-10-01), Jones, Jr.
patent: 5773314 (1998-06-01), Jiang et al.
patent: 5796133 (1998-08-01), Kwon et al.
patent: 6188098 (2001-02-01), Amanuma
patent: 6211035 (2001-04-01), Moise et al.
patent: 6313539 (2001-11-01), Yokoyama et al.
patent: 6459111 (2002-10-01), Natori et al.
patent: 967651 (1999-12-01), None
patent: 1 067 605 (2001-01-01), None
patent: 07-099290 (1995-04-01), None
patent: 07-321232 (1995-12-01), None
patent: 07-321234 (1995-12-01), None
patent: 08-288470 (1996-11-01), None
patent: 10-189914 (1998-07-01), None
patent: 11-8355 (1999-01-01), None
patent: 11-121704 (1999-04-01), None
patent: 11-126881 (1999-05-01), None
patent: 11-145410 (1999-05-01), None
patent: 2000-133633 (2000-05-01), None
patent: 2001-044376 (2001-02-01), None
patent: WO 96/17386 (1996-06-01), None
Matsushita Electric - Industrial Co., Ltd.
Nixon & Peabody LLP
Pizarro-Crespo Marcos D.
Studebaker Donald R.
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