Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1998-02-20
1999-10-19
Chang, Joni
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438 3, H01L 218242
Patent
active
059703377
ABSTRACT:
A method of making ferroelectric film capacitors with sufficient yield for application to ULSI. In a first embodiment, after formation of a first ferroelectric film as the capacitor ferroelectric film, a very thin second ferroelectric film is deposited to fill the cavity portions generated between the crystal grains. This reduces the leakage current and increases the capacitor yield. In second embodiment, the cavity portions are filled with an insulating layer.
REFERENCES:
patent: 5789303 (1998-08-01), Leung et al.
patent: 5834348 (1998-11-01), Kwon et al.
Chang Joni
Donaldson Richard L.
Kempler William B.
Laws Gerald E.
Texas Instruments Incorporated
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