Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2007-02-20
2007-02-20
Estrada, Michelle (Department: 2823)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S393000, C438S396000, C438S508000, C438S508000, C257SE27048, C257SE21009, C257SE21011, C257SE21664
Reexamination Certificate
active
11233264
ABSTRACT:
A method for manufacturing a ferroelectric capacitor includes successively disposing a lower electrode, at least one intermediate electrode and an upper electrode over a base substrate, and providing ferroelectric films between the electrodes, respectively. In the step of forming the intermediate electrode, (a) a first metal film is formed by a sputter method over the ferroelectric film, and (b) a second metal film is formed by a vapor deposition method over the first metal film.
REFERENCES:
patent: 5206788 (1993-04-01), Larson et al.
patent: 2002/0024073 (2002-02-01), Shimada et al.
patent: 2001-230384 (2001-08-01), None
Kijima Takeshi
Ohashi Koji
Estrada Michelle
Seiko Epson Corporation
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