Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – By reaction with substrate
Reexamination Certificate
2006-06-20
2006-06-20
Nhu, David (Department: 2818)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
By reaction with substrate
C438S184000, C438S230000
Reexamination Certificate
active
07064085
ABSTRACT:
A feed-forward method and apparatus for controlling spacer width measures spacer width during processing then further processes the spacers in a spacer width adjustment operation to achieve a desired final spacer width. Silicon nitride spacers may be measured after plasma etching and the measured spacer width is automatically compared to the final desired spacer width and a time for further processing is calculated based on a correlation between processing time and spacer width loss. Using computer interface manufacturing, the measured spacer width data is provided to a computer that performs the calculation and provides the further processing time or a recipe to the tool used for the spacer width adjustment operation. The spacer width adjustment operation may be wet processing in an SPM solution that oxidizes the spacers and an HF clean operation may be used to remove the oxidized portion and yield spacer widths within acceptable specification limits.
REFERENCES:
patent: 6005272 (1999-12-01), Gardner et al.
patent: 6323519 (2001-11-01), Gardner et al.
patent: 6551887 (2003-04-01), Kwon et al.
patent: PCT/JP95/00592 (1995-03-01), None
Chiu Yih-Song
Huang Jao-Sheng
Leu Chen-Hsiang
Tsai Wen-Ting
Duane Morris LLP
Nhu David
Taiwan Semiconductor Manufacturing Company
LandOfFree
Feed forward spacer width control in semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Feed forward spacer width control in semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Feed forward spacer width control in semiconductor... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3680642