Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2007-10-30
2007-10-30
Masinick, Michael D. (Department: 2125)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C356S625000, C438S014000, C700S110000
Reexamination Certificate
active
10710447
ABSTRACT:
A system, method and program product for correcting a deviation of a dimension of a feature from a target in a semiconductor process, are disclosed. The invention determines an origin of a deviation in a feature dimension from a target dimension regardless of whether it is based on processing or metrology. Adjustments for wafer processing variation of previous process tools can be fed forward, and adjustments for the process and/or integrated metrology tools may be fed back automatically during the processing of semiconductor wafers. The invention implements process reference wafers to determine the origin in one mode, and measurement reference wafers to determine the origin of deviations in another mode.
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Funk Merritt L.
Horak David V.
Lally Kevin J.
Natzle Wesley C.
Prager Daniel
Hoffman Warnick & D'Alessandro LLC
International Business Machines - Corporation
Masinick Michael D.
Petrokaitis Joseph
Tokyo Electron Limited
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